OTF Studio®
Thin Film Software for Any Challenge
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OTF Studio,® developed since early 2023, is a modern solution for the design, analysis, monitoring, and reverse engineering of multilayer optical coatings. The software is already well established in the industry and recognized for its rapid evolution, robust software architecture, and advanced capabilities.
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Powered by a newly developed, highly effective computational framework, OTF Studio® ensures both computational speed and stability in performance. Continuous innovation and integration of user feedback have quickly made it a reliable and leading tool for professionals in the optical thin-film field.
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Learn more in Development history
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Modern, fast, effective, intuitive, and user-friendly
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Functionalities required for optical coating designers
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Thin-film designs of any complexity
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Highly effective state-of-the-art software solutions
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Powerful and speedy optimization and synthesis algorithms; some of them, with incorporated machine learning (see demo videos on design).
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Production-friendly design tools: Smart Brush algorithm and BoundTrap algorithm.
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Multi-Start algorithms with machine learning and Jumps setting.
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Flexible and reliable reverse engineering models.
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Original and smart algorithms for characterization of monolayers.
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Easy import of measurement data from many spectrophotometers, ellipsometers, Excel files, and via drag-and-drop.
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Spectral and angular plots; second Y-Axis, 2D and 3D plots, tooltips, different scales (linear, logarithmic, diabatic).
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Modern chart designer, dashboard layout.
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Project management using standard operations (new, open, save, save as) available at Quick Access Toolbar or using a standard back-stage interface.
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Modern ribbon interface and customizable layout.
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Docking technology for tables, panels, and plots.
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Special design options for ultrafast applications (dispersive mirrors, complementary pairs, double-angle method).
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Color design and analysis options: color diagrams, color differences, color patch, color specifications, Monte-Carlo analysis of colors, freeze and compare.
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Electric field optimization (see demo-video).
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Integral values; comparison of integral values.
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Stress and thickness optimization (see demonstration videos).
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Robust synthesis
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Advanced materials
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Rugate synthesis
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U- and g-values according to EN 410/673, NFRC Winter, and NFRC Summer.
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Operations with measurements: Compare, Append, and Combine.
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Multi-scan measurements import and processing.
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Batch measurements, batch processing, and visualization.
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Multi-Environments: analysis and design.
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Monte-Carlo analysis and yield analysis; worst-case performance.
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The interactive analysis tool operates for all active plots and panels in the dashboard layout.
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Interactive Admittance diagram including iso-reflectivity curves.
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Expressions and linked expressions.
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Concept of the Machine and automatic generation of advanced monitoring strategies.
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Generation of monitoring spreadsheets.
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Special design and analysis options for Multi-QWOT narrow band pass filters.
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My Catalog feature for layer materials, substrates, and light sources.
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Non-parametric model for complex characterization problems.
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Advanced materials support.
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Reports including plots directly to Word, PDF, Excel, or to print.
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OTF Studio provides external access to almost all its algorithms and parameters through powerful COM interfaces.
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